发明名称 Presumably defective portion decision apparatus, presumably defective portion decision method, fabrication method for semiconductor device and program
摘要 Disclosed herein is a presumably defective portion decision apparatus, including: an arithmetic operation section configured to divide a level difference included in level difference data which indicate a level difference distribution on the surface of a semiconductor device into two or more unit level differences in the depthwise direction of the level difference and determine, for each of the unit level differences obtained by the division, a relationship between the height of a contour line at a level difference position of an upper face and an area of an opening surrounded by the contour line to decide presence or absence of a presumably defective portion.
申请公布号 US9435643(B2) 申请公布日期 2016.09.06
申请号 US201313754635 申请日期 2013.01.30
申请人 SONY CORPORATION 发明人 Izuha Kyoko;Hirata Tatsushiro;Shibuki Shunichi
分类号 H01L21/02;G01B21/02;H01L21/66 主分类号 H01L21/02
代理机构 Chip Law Group 代理人 Chip Law Group
主权项 1. A defective portion decision apparatus, comprising: one or more processors operable to: divide a level difference, which indicates a level difference distribution on a surface of a semiconductor device, into two or more unit level differences in a depthwise direction of the level difference;generate a contour line diagram of the level difference for each of the two or more unit level differences based on position coordinates acquired for each of the two or more unit level differences;determine, for each of the divided two or more unit level differences, a relationship between height of each of the divided two or more unit level differences, from a predetermined position of the level difference, and a corresponding area of each opening surrounded by a contour line formed using each of the divided two or more unit level differences in the generated contour line diagram,wherein the relationship is a value obtained by computing a difference between heights of two consecutive unit level differences divided by a difference between square roots of corresponding areas of opening surrounded by the contour lines; anddecide presence or absence of the defective portion on the surface of the semiconductor device based on comparison of the computed value against a predetermined threshold value.
地址 Tokyo JP