| 发明名称 |
Composition and method for treating a semiconductor substrate |
| 摘要 |
The present invention relates to a composition for cleaning a substrate, in particular a semiconductor substrate comprising an alkaline compound and a complexing compound having the formula of figure 1. <??>The present invention also relates to a method for cleaning a substrate using a composition comprising a complexing compound having the formula of figure 1.
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| 申请公布号 |
EP1544284(A1) |
申请公布日期 |
2005.06.22 |
| 申请号 |
EP20040447282 |
申请日期 |
2004.12.17 |
| 申请人 |
INTERUNIVERSITAIR MICROELEKTRONICA CENTRUM ( IMEC) |
发明人 |
DE WAELE, RITA;VOS, RITA |
| 分类号 |
C11D3/02;C11D3/26;C11D3/30;C11D3/34;C11D7/32;C11D7/34;C11D11/00;(IPC1-7):C11D3/26 |
主分类号 |
C11D3/02 |
| 代理机构 |
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