| 摘要 |
An exposure apparatus for exposing a pattern on an exposure original onto a substrate using exposure light, includes a projection optical system for projecting the pattern on the exposure original onto the substrate, a first detection system that provides an alignment between the exposure original and the substrate in a plane orthogonal to an optical axis of the projection optical system, and a focus detecting system for detecting focusing condition of the projection optical system, the focus detection system includes a light intensity sensor for detecting light intensity of light which passed the projection optical system, wherein the focus detection system is calibrated based on the detection result of the first detection system.
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