SUBSTRATE TREATMENT DEVICE AND SUBSTRATE TREATMENT METHOD

摘要

PROBLEM TO BE SOLVED: To provide a substrate treatment device and a substrate treatment method that allow to excellently remove organic matter deposited on a substrate. SOLUTION: A removal unit 10 is mainly provided with a plurality of discharge nozzles 11, which discharge micro-bubble water 11a toward a substrate W, and a micro-bubble generation part 21 so as to remove organic matter deposited on the substrate W. A cleaning unit 60 is mainly provided with a plurality of upper nozzles 61, a plurality of lower nozzles 62, and a reservoir tank 80 so as to apply rinse treatment by pure water to the substrate W subject to organic-matter removal treatment by the removal unit 10. COPYRIGHT: (C)2008,JPO&INPIT