发明名称 Pulsed laser source with high repetition rate
摘要 Methods and systems for generating pulses of laser radiation at higher repetition rates than those of available excimer lasers are disclosed that use multiple electronic triggers for multiple laser units and arrange the timings of the different triggers with successive delays, each delay being a fraction of the interval between two successive pulses of a single laser unit. Methods and systems for exposing nanoscale patterns using such high-repetition-rate lasers are disclosed.
申请公布号 US8467424(B2) 申请公布日期 2013.06.18
申请号 US201113135290 申请日期 2011.06.30
申请人 JAIN KANTI;ANVIK CORPORATION 发明人 JAIN KANTI
分类号 H01S3/10 主分类号 H01S3/10
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