发明名称 Cu-Ni-Si-based copper alloy plate having excellent deep drawing workability and method of manufacturing the same
摘要 The Cu—Ni—Si-based copper alloy plate contains 1.0 mass % to 3.0 mass % of Ni, and Si at a concentration of ⅙ to ¼ of the mass % concentration of Ni with a remainder of Cu and inevitable impurities, in which, when the average value of the aspect ratio (the minor axis of crystal grains/the major axis of crystal grains) of each crystal grains in an alloy structure is 0.4 to 0.6, the average value of GOS in the all crystal grains is 1.2° to 1.5°, and the ratio (Lσ/L) of the total special grain boundary length Lσ of special grain boundaries to the total grain boundary length L of crystal grain boundaries is 60% to 70%, the spring bending elastic limit becomes 450 N/mm2 to 600 N/mm2, the solder resistance to heat separation is favorable and deep drawing workability is excellent at 150° C. for 1000 hours.
申请公布号 US9435016(B2) 申请公布日期 2016.09.06
申请号 US201013808351 申请日期 2010.07.07
申请人 Mitsubishi Shindoh Co., Ltd. 发明人 Sakurai Takeshi;Abe Yoshio;Saito Akira;Kameyama Yoshihiro
分类号 C22F1/08;C22C9/06;H01B1/02;C22C9/04;C22F1/00;C22C9/10 主分类号 C22F1/08
代理机构 Locke Lord LLP 代理人 Locke Lord LLP ;Armstrong, IV James E.;DiCeglie, Jr. Nicholas J.
主权项 1. A Cu—Ni—Si-based copper alloy plate comprising: 1.0 mass % to 3.0 mass % of Ni; 0.2 mass % to 0.8 mass % of Sn; 0.3 mass % to 1.5 mass % of Zn; 0.001 mass % to 0.2 mass % of Mg; and Si at a concentration of ⅙ to ¼ of a mass % concentration of Ni, with a remainder of Cu and inevitable impurities, wherein, an average value of aspect ratios (a minor axis of crystal grains/a major axis of crystal grains) of each crystal grains in an alloy structure is 0.4 to 0.6, an average value of GOS in all crystal grains, which is measured through an EBSD method using a scanning electron microscope equipped with an electron backscatter diffraction image system, is 1.2° to 1.5°, wherein a boundary for which an orientation difference between adjacent pixels is 5° or more as a crystal grain boundary, by measuring orientations of all pixels in a measurement area range; and a ratio (Lσ/L) of a total special grain boundary length Lσ of special grain boundaries to a total grain boundary length L of crystal grain boundaries is 60% to 70%, a spring bending elastic limit becomes 450 N/mm2 to 600 N/mm2, a solder resistance to heat separation is favorable and deep drawing workability is excellent at 150° C. for 1000 hours.
地址 Shinagawa-ku JP