Optical metrology for in-situ measurements

摘要

A method and system are presented for use in controlling a process applied to a patterned structure having regions of different layered stacks. The method comprises: sequentially receiving measured data indicative of optical response of the structure being processed during a predetermined processing time, and generating a corresponding sequence of data pieces measured over time; and analyzing and processing the sequence of the data pieces and determining at least one main parameter of the structure. The analyzing and processing comprises: processing a part of said sequence of the data pieces and obtaining data indicative of one or more parameters of the structure; utilizing said data indicative of said one or more parameters of the structure and optimizing model data describing a relation between an optical response of the structure and one or more parameters of the structure; utilizing the optimized model data for processing at least a part of the sequence of the measured data pieces, and determining at least one parameters of the structure characterizing said process applied to the structure, and generating data indicative thereof.

主权项

1. A method for use in in-situ controlling a process applied to a patterned structure having regions of different layered stacks, the method comprising:
(a) sequentially receiving measured data indicative of optical response of the structure formed by multiple signals from the different layered stacks in the structure being processed during a predetermined processing time, and generating a corresponding sequence of data pieces measured over time, wherein each of the data pieces corresponds to a common signature formed by the multiple signals from the different layered stacks; (b) analyzing and processing the sequence of the data pieces and determining at least one main parameter of the structure, wherein said analyzing and processing comprises:
i) processing a part of said sequence of the data pieces and obtaining data indicative of one or more parameters of the structure,ii) utilizing said data indicative of said one or more parameters of the structure and optimizing model data describing a relation between an optical response of the different layered stacks in the structure and one or more parameters of the structure;iii) utilizing the optimized model data for processing at least a part of the sequence of the measured data pieces, and determining at least one parameters of the structure characterizing said process applied to the structure, and generating data indicative thereof.