| 摘要 |
PROBLEM TO BE SOLVED: To arrange a spacer cell without reference to a peripheral state and to make variance in transistor characteristic constant. SOLUTION: Spacers 14a and 14b are disposed between diffusion regions 11a and 11b, constituting a semiconductor element, and an element separation trench opposite the diffusion regions 11a and 11b to make constant stress from the element separation trench to the diffusion regions. Consequently, the spacers 14a and 14b can be disposed without reference to the peripheral state, the variance in transistor characteristic can be made constant, and a high-reliability semiconductor integrated circuit can be fabricated. COPYRIGHT: (C)2008,JPO&INPIT
|
