| 发明名称 |
METHOD OF DETECTING PHOTOLITHOGRAPHIC HOTSPOTS |
| 摘要 |
A method for detecting photolithographic hotspots is disclosed. After receiving layout data, an aerial image simulation is conducted to extract aerial image intensity indices. Based on the combination of one or more aerial image intensity indices, various aerial image detectors are generated. The value of aerial image detectors is verified to determine the position and type of the photolithographic hotspots. |
| 申请公布号 |
US2016321793(A1) |
申请公布日期 |
2016.11.03 |
| 申请号 |
US201514742717 |
申请日期 |
2015.06.18 |
| 申请人 |
Powerchip Technology Corporation |
发明人 |
Chang Yi-Shiang;Lin Chia-Chi;Yeh Shin-Shing;Shih Pei-Shan;Lai Jun-Cheng |
| 分类号 |
G06T7/00;G06T5/00;G06K9/46 |
主分类号 |
G06T7/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method for detecting a photolithographic hotspot, comprising:
receiving layout data; performing an aerial image simulation on said layout data to extract a plurality of aerial image intensity indices comprising an aerial image intensity maximum (Imax), an aerial image intensity minimum (Imin), an aerial image intensity threshold (Ith) and an aerial image intensity array (Iarray); generating an aerial image detector based on the mathematical combination of said aerial image intensity indices; and determining the position and the type of a corresponding photolithographic hotspot in accordance with the value of said aerial image detector. |
| 地址 |
Hsinchu TW |
