| 摘要 |
PROBLEM TO BE SOLVED: To execute reactive sputtering with high efficiency and to form a thin film of high quality at a high speed by providing independent ring strip- shaped sputtering targets. SOLUTION: Ring strip-shaped targets 7a are composed as a pair of independent targets. Moreover, disk-shaped targets 7b are composed as a pair of idependent targets located at the gaps on the innermost part of each ring strip- shaped target 7a. In an ordinary opposited type target sputtering system, the magnetic field on the center part is made intensive than that on the circumferential part of the target. Thus, for correcting it, the electric power to be fed to the disk-shaped target 7b on the inside is reduced compared to that to the ring strip-shaped target 7a on the circumferential part, and plasma is made uniform as the whole. In this way, approximately uniform sputtering velocity and oxidizing velocity are obtd. over the whole face of the target, it has an approximately uniform erosion region 6, and, the deposition, e.g., of an oxide thin film of high quality at a high speed is made possible.
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