发明名称 VACUUM DEPOSITION SYSTEM
摘要 According to the invention, the efficiency and productivity of a vacuum deposition system for the application of a layer on a substrate, in particular, for the deposition of glass, glass-ceramic, and/or ceramic layers from the vapour phase on a substrate, may be improved, whereby a substrate holder device with moving segments is provided, which can adopt a first position for the insertion or removal of substrates and a second position for deposition. The invention further relates to an exchange device for the exchange of vaporising materials within a vacuum deposition chamber and vaporising material units suitable for the above. Furthermore, a vacuum deposition unit with said devices and a corresponding method for coating substrates are disclosed.
申请公布号 WO2006069774(A3) 申请公布日期 2006.10.05
申请号 WO2005EP14042 申请日期 2005.12.27
申请人 SCHOTT AG;MUND, DIETRICH;FUKAREK, WOLFGANG 发明人 MUND, DIETRICH;FUKAREK, WOLFGANG
分类号 C23C14/50;C23C14/24;C23C14/56 主分类号 C23C14/50
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