| 摘要 |
The invention relates to a method for the analysis of ordered structures with limited geometry. According to said method, a first structural image with Bragg reflexes is produced by appropriate irradiation of the structures, and a second structural image is produced from said first structural image, under partial direction-selective and structure-selective masking of the Bragg reflexes, with masking-specific colour and/or intensity progressions that are then detected and evaluated in a suitable manner. The axial symmetry of the structures, the orientation of individual elementary cells and the location correlation thereof, and the type and number of available structures are determined by local resolution. The second structural image can be evaluated by means of a data processing device. The inventive method can be used, for example, for quality control during the production of ordered monolayers and multilayers of colloids, especially two-dimensional or three-dimensional optical grids and data memories. The invention also relates to a device for carrying out said method. |
