| 摘要 |
PROBLEM TO BE SOLVED: To provide a nozzle cleaning mechanism for reliably cleaning a cleaning liquid supplying nozzle while reducing the consumption of a wiping member, and to provide an apparatus for treating a substrate using the nozzle cleaning mechanism. SOLUTION: This nozzle cleaning mechanism is provided with a bracket 42 to be moved along a rail 41 arranged in parallel to a resist applying nozzle, and a wiping part 45 arranged above the bracket 42. The part 45 is provided with a casing 51, a feed roll 53 around which the long-length wiping member 52 consisting of wiping paper, wiping cloth or the like are wound, a take-up roll 54 for taking-up the member 52 fed from the roll 53, and the cleaning liquid supplying nozzle for supplying a cleaning liquid to the member 52. COPYRIGHT: (C)2007,JPO&INPIT
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