A sputtering apparatus (10) and method for producing a reflective coating on a substrate includes a production chamber (14) and a sputtering station (22) located within the production chamber (14). A moving means (16) is provided for moving the 5 substrate through the sputtering station (22) in a first direction and moving the substrate through the sputtering station (22) in a second direction. A common access port (18) is provided for loading and unloading of the substrate from the production chamber (14). The substrate may be toughened glass.
