METHOD FOR FORMING A PATTERNED FILM, METHOD FOR MANUFACTURING OPTICAL COMPONENT, METHOD FOR MANUFACTURING CIRCUIT BOARD, AND METHOD FOR MANUFACTURING ELECTRONIC COMPONENT

摘要

A method is provided which allows the alignment marks of a mold and a substrate to be accurately and simply detected, and accordingly provides a method for forming a patterned film with a high throughput, and also provides a method for manufacturing an optical component, a method for manufacturing a circuit board, and a method for manufacturing an electronic component.;A patterned film is formed by photo-nanoimprinting. In the method, a gas satisfies the following Inequality (1):;In the Inequality (1), nR represents the refractive index of a composition not containing a gas at the wavelength of light, nR′ a represents the refractive index of the photo-curable composition containing the gas at the wavelength of the light, and nM represents the refractive index of a mold at the wavelength of the light.;[Math. 16];|nM−nR|≦|nM−nR′|  (1)

主权项

1. A method for forming a patterned film, the method comprising:
supplying a gas between photo-curable composition R on a substrate having alignment mark B and a mold having alignment mark A; bringing the photo-curable composition R into contact with the mold, thereby turning the photo-curable composition R into photo-curable composition R′ in which the gas is dissolved; detecting light from the alignment mark A and the alignment mark B by irradiating the mold and the substrate with light a; aligning the alignment mark A with the alignment mark B according to the detected light; curing the photo-curable composition R′ into a cured film by irradiating the photo-curable composition R′ with light b having a different wavelength than the light a; and separating the cured film from the mold,wherein the gas satisfies the following Inequality (1):
[Math.11] |nM−nR|≦|nM−nR′|  (1) wherein nR represents the refractive index of the photo-curable com-position R at the wavelength of the light a, nR′ represents the refractive index of the photo-curable composition R′ at the wavelength of the light a, and nM represents the refractive index of the mold at the wavelength of the light a.