发明名称 ALIGNMENT MARK, RETICLE, AND CHARGED PARTICLE BEAM EXPOSURE SYSTEM
摘要 <p><P>PROBLEM TO BE SOLVED: To provide an alignment mark, or the like, ensuring a sufficient contrast when the position of a reticle is detected. <P>SOLUTION: An alignment mark 14 is made by depositing such a substance (chromium oxide (CrO)) as ensuring a contrast sufficient for detecting a mark when a silicon substrate is irradiated with a probe light on a reticle substrate 10 made of silicon (Si). <P>COPYRIGHT: (C)2005,JPO&NCIPI</p>
申请公布号 JP2005050851(A) 申请公布日期 2005.02.24
申请号 JP20030202871 申请日期 2003.07.29
申请人 NIKON CORP 发明人 UDAGAWA HITOSHI
分类号 G03F1/20;G03F1/42;G03F7/20;H01L21/027;(IPC1-7):H01L21/027;G03F1/08;G03F1/16 主分类号 G03F1/20
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