发明名称 |
MULTI-COLUMN ELECTRON BEAM EXPOSURE DEVICE |
摘要 |
A multi-column type electron beam exposure apparatus includes: plural column cells disposed over a wafer, each including an electron gun, deflector for deflecting an electron beam emitted by the electron gun, and exposure data receiving unit for receiving exposure data; and correction computing unit for calculating the exposure data for use in the column cells. The correction computing unit includes exposure data controlling unit and exposure data transmitting unit for each of the column cells. The exposure data transmitting unit encodes the exposure data corrected by the exposure data controlling unit to convert the data into serial data, converts the serial data into a light signal, and transmits the light signal. The exposure data receiving unit converts the light signal into an electric signal, and decodes the encoded exposure data to convert the data into parallel data.
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申请公布号 |
EP1865538(A1) |
申请公布日期 |
2007.12.12 |
申请号 |
EP20060730219 |
申请日期 |
2006.03.28 |
申请人 |
ADVANTEST CORPORATION |
发明人 |
YABARA, HIDEFUMI;MIYAZAWA, KENICHI;SAKAZAKI, TOMOHIRO;TANAKA, KAZUAKI |
分类号 |
H01L21/027;G03F7/20;H01J37/05;H01J37/305;H01J37/317 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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