Method and system for systematic defect identification

摘要

A method and apparatus for identifying suspect layout features from a plurality of layout features of an integrated circuit (IC) layout. A plurality of snippet images is generated, each of which depicts at least a portion of a suspect layout feature which is different from suspect layout features depicted in others of the plurality of snippet images. The suspect layout features are determined based on the diagnosis of a plurality of defective ICs manufactured in accordance with the IC layout. A plurality of clusters is generated, and each of the clusters contains a group of the plurality of snippet images based on similarities between the snippet images.