发明名称 |
Imaging element and imaging device |
摘要 |
An imaging element includes: a semiconductor substrate in which a plurality of pixels is arranged in a two-dimensional array; a color filter layer which is laminated in a position corresponding to the pixel on an upper layer of the semiconductor substrate; a plurality of micro lenses which is laminated on an upper layer of the color filter layer to condense light which is incident onto the pixel; and an isolated columnar reflective wall which is vertically provided in an intermediate layer between the semiconductor substrate and the micro lens at every position of a gap enclosed by the plurality of adjacent micro lenses and reflects the light which is incident onto the color filter from the gap to a direction facing the pixel corresponding to the color filter. |
申请公布号 |
US9386206(B2) |
申请公布日期 |
2016.07.05 |
申请号 |
US201414500154 |
申请日期 |
2014.09.29 |
申请人 |
FUJIFILM Corporation |
发明人 |
Tanaka Shunsuke |
分类号 |
H04N5/225;H01L27/146;H04N9/07;H04N5/369 |
主分类号 |
H04N5/225 |
代理机构 |
Birch, Stewart, Kolasch & Birch, LLP |
代理人 |
Birch, Stewart, Kolasch & Birch, LLP |
主权项 |
1. An imaging element, comprising:
a semiconductor substrate in which a plurality of pixels is arranged in a two-dimensional array; a color filter layer which is laminated in a position corresponding to the pixel on an upper layer of the semiconductor substrate; a plurality of micro lenses which is laminated on an upper layer of the color filter layer to condense light which is incident onto the pixel; and an isolated columnar reflective wall which is vertically provided in an intermediate layer between the semiconductor substrate and the micro lens at every position of a gap enclosed by adjacent three or more of the micro lenses and reflects the light which is incident onto the color filter from the gap to a direction facing the pixel corresponding to the color filter. |
地址 |
Tokyo JP |