发明名称 METHOD FOR MAKING AN INTERCONNECT STRUCTURE AND INTERCONNECT COMPONENT RECOVERY PROCESS
摘要 A method is provided for making an interconnect structure. The method includes applying a removable layer to an electronic device or to a base insulative layer; applying an adhesive layer to the electronic device or to the base insulative layer; and securing the electronic device to the base insulative layer using the adhesive layer.
申请公布号 US2008318413(A1) 申请公布日期 2008.12.25
申请号 US20070766302 申请日期 2007.06.21
申请人 GENERAL ELECTRIC COMPANY 发明人 FILLION RAYMOND ALBERT;ESLER DAVID RICHARD;ERLBAUM JEFFREY SCOTT;MILLS RYAN CHRISTOPHER;WOYCHIK CHARLES GERARD
分类号 H01L21/4763 主分类号 H01L21/4763
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