发明名称 SEMICONDUCTOR DEVICE STRUCTURE
摘要 <p>PURPOSE: A semiconductor element structure is provided to generate high voltage by forming a groove between a first semiconductor device and a second semiconductor device. CONSTITUTION: A first semiconductor device (2a) has at least two electrodes. A second semiconductor device (2b) has at least two electrodes. An encapsulating material (4) covers the first semiconductor device and the second semiconductor device. A groove (4f) is formed between the first semiconductor device and the second semiconductor device. The groove has a slit shape.</p>
申请公布号 KR101299562(B1) 申请公布日期 2013.08.23
申请号 KR20120093191 申请日期 2012.08.24
申请人 CTLAB CO., LTD. 发明人 KIM, CHANG TAE
分类号 H01L33/48;H01L33/52 主分类号 H01L33/48
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