METHOD AND APPARATUS FOR INSPECTION OF SCATTERED HOT SPOT AREAS ON A MANUFACTURED SUBSTRATE

摘要

One embodiment relates to a method of automated inspection of scattered hot spot areas on a manufactured substrate using an electron beam apparatus. A stage holding the substrate is moved along a swath path so as to move a field of view of the electron beam apparatus such that the moving field of view covers a target area on the substrate. Off-axis imaging of the hot spot areas within the moving field of view is performed. A number of hot spot areas within the moving field of view may be determined, and the speed of the stage movement may be adjusted based on the number of hot spot areas within the moving field of view. Another embodiment relates to an electron beam apparatus for inspecting scattered areas on a manufactured substrate. Other embodiments, aspects and features are also disclosed.

主权项

1. An electron beam apparatus comprising:
an electron source for generating a primary electron beam; a lens system configured to focus the primary electron beam onto a surface of the substrate; a detector configured to detect scattered electrons from the substrate; a stage configured to hold the substrate and controllably move the substrate under the primary electron beam; and one or more controllers configured to control movement of the stage along a path so as to move a field of view of the electron beam apparatus such that the moving field of view covers a target area on the substrate, wherein the controller is further configured to control off-axis imaging of one or more hot spot areas within the moving field of view.