ELECTRON BEAM GENERATOR, IMAGE APPARATUS INCLUDING THE SAME AND OPTICAL APPARATUS

摘要

Provided may include an electron beam generator, an image apparatus including the same, and an optical apparatus. The optical apparatus includes a first and second laser apparatuses providing a first and second laser beams on a substrate, and a first optical system provided between the first and second laser apparatuses and the substrate to focus the first and second laser beams. The first and second laser beams overlap with each other generating an interference beam, thereby decreasing a spot size of the interference beam to be smaller than a wavelength of each of the first and second laser beams at a focal point.

主权项

1. An electron beam generator comprising:
a beam source supply unit configured to provide a beam source on a substrate; a first laser apparatus configured to provide a first laser beam to the beam source and the substrate; a first optical system having a focal point on the substrate and configured to concentrate the first laser beam on the substrate; and a second laser apparatus configured to provide a second laser beam overlapping the first laser beam between the first optical system and the first laser apparatus; wherein the second laser apparatus outputs the second laser beam which has a phase opposite to a phase of the first laser beam, and decreases a first spot size of an interference beam generated by a destructive interference with the first laser beam to be smaller than a wavelength of the first laser beam at the focal point.