DIBLOCK COPOLYMER BLEND COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a self-assembling material that has etching resistance needed for transferring a desired pattern easily to a substrate in a microelectronic device.SOLUTION: A diblock copolymer blend containing a unique combination of an ordered poly(styrene)-b-poly(methyl methacrylate) diblock copolymer and a disordered poly(styrene)-b-poly(methyl methacrylate) diblock copolymer is provided. Further, provided are substrates treated with the diblock copolymer blend.