| 摘要 |
PROBLEM TO BE SOLVED: To position a wafer to an exposure position accurately during exposure.SOLUTION: A control device controls a drive system of a stage WST on the basis of positional information measured by an encoder system, while compensating a measurement error of the encoder system caused by a scale. In the control device, a reference member is arranged below alignment systems (AL1, AL2to AL2) so that a mark M of the reference member 46 can be detected on each of plural detection areas, and the control device acquires relative positional information of the plural detection areas and controls drive of the stage WST so that the wafer W can be relatively moved in a Y direction with respect to the plural detection areas, for detecting plural marks of the wafer W disposed in different positions in the Y direction on at least a part of the plural detection areas of the alignment systems, in a detection operation of the marks by the alignment systems. The detection information of the marks by the alignment systems is used in an exposure operation of the wafer W.SELECTED DRAWING: Figure 21 |
