| 摘要 |
<p>A spin coater for spinner is provided to maximize productivity due to a loading error or a teaching error of a main arm by installing a sensor at a spinner in order to sense the main arm. A spin chuck is used for absorbing a wafer in a horizontal state and rotating the wafer at high speed. A plurality of nozzles are provided according to photoresist in order to drop the photoresist on the wafer absorbed to the spin chuck. A nozzle arm is used for selecting one of the plurality of nozzles and moving the selected nozzle to a center of the wafer. A nozzle holder(218) is formed at one side of the spin chuck in order to prepare the nozzles. The nozzles are inserted commonly into an opening hole(217a) of the nozzle holder.</p> |
