| 摘要 |
PROBLEM TO BE SOLVED: To provide a chemical oxidization preventing device which prevents the mixture of impurities and chemical oxidization, and also to provide its method. SOLUTION: The chemical oxidization preventing device 1 comprises: a circulation tub 10 having the chemical 61; a first inactive gas supply means 27 for supplying inactive gas to the circulation tub 10 and raising pressure inside the circulation tub 10 to be higher than that outside the tub 10; a chamber 40 for storing a wafer 60, supplying the chemical 61 to the wafer 60, and cleaning the wafer 60; and a second inactive gas supply means 57 for supplying the inactive gas to the chamber 40, and raising the pressure inside the chamber 40 to be higher than that outside the chamber 40. COPYRIGHT: (C)2008,JPO&INPIT
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