| 发明名称 |
ORIENTED SUBSTRATE FOR USE IN FORMATION OF EPITAXIAL FILM, AND METHOD FOR PRODUCING SAME |
| 摘要 |
The present invention provides a textured substrate for forming an epitaxial film, including a textured metal layer on at least one surface of the layer, the textured metal layer including a copper layer having a cube texture, the textured metal layer having, on a surface of the layer, palladium added in an amount of 10 to 300 ng/mm2 per unit area, the hydrogen content of the surface of the textured metal layer being 700 to 2000 ppm. This textured substrate is produced through a step of adding 10 to 300 ng/mm2 per unit area of palladium by strike plating to a surface of the copper layer having a cube texture. |
| 申请公布号 |
US2016163425(A1) |
申请公布日期 |
2016.06.09 |
| 申请号 |
US201414907893 |
申请日期 |
2014.07.22 |
| 申请人 |
TANAKA KIKINZOKU KOGYO K.K. |
发明人 |
KASHIMA Naoji;WATANABE Tomonori;NAGAYA Shigeo;SHIMA Kunihiro;KUBOTA Shuichi;SUGANUMA Ryosuke |
| 分类号 |
H01B12/06;C30B29/02;C30B29/22;C30B19/12 |
主分类号 |
H01B12/06 |
| 代理机构 |
|
代理人 |
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| 主权项 |
1. A textured substrate for forming an epitaxial film, comprising a textured metal layer on at least one surface of the layer, wherein the textured metal layer comprises a copper layer having a cube texture, the textured metal layer has, on a surface of the layer, palladium added in an amount of 10 to 300 ng/mm2 per unit area, and a hydrogen content of the surface of the textured metal layer is 700 to 2000 ppm. |
| 地址 |
Tokyo JP |
