| 摘要 |
PROBLEM TO BE SOLVED: To provide a protective film having good release properties, antistatic properties, adhesiveness to a copper foil of a photosensitive resin layer and uneven feeling of the surface of a photosensitive resin layer as a protective film for a dry film resist and to provide a photosensitive resin laminate formed by laminating the protective film.SOLUTION: There are provided: a protective film for a dry film resist which has a coating layer formed of a coating liquid containing a long-chain alkyl group-containing compound, an antistatic agent and an acrylic resin or polyvinyl alcohol on one surface of a polyester film, wherein the surface of the coating layer has a center line average roughness (Ra) of 0.10 to 0.50 μm; and a photosensitive resin laminate which has a configuration in which the protective film is laminated on the surface of a photosensitive resin layer formed on a base film.SELECTED DRAWING: Figure 1 |
