| 摘要 |
PROBLEM TO BE SOLVED: To provide a monitoring element and a manufacturing method of an oscillator capable of reducing degradation of processing accuracy.SOLUTION: A monitoring element 300 includes: a wafer substrate 100; a monitoring sacrificial layer 320 disposed over the wafer substrate 100; and a ceiling layer 330 resistive to etching, which is dispose of the monitoring sacrificial layer 320 and is formed with continuous holes (etching release hole) 330a for removing the monitoring sacrificial layer 320 by means of etching. The ceiling layer 330 contains a polysilicon.SELECTED DRAWING: Figure 2 |
