发明名称 半導体装置およびその製造方法
摘要 In a transistor including a wide band gap semiconductor layer as a semiconductor layer, a wide band gap semiconductor layer is separated into an island shape by an insulating layer with passivation properties for preventing atmospheric components from permeating. The edge portion of the island shape wide band gap semiconductor layer is in contact with the insulating film; thus, moisture or atmospheric components can be prevented from entering from the edge portion of the semiconductor layer to the wide band gap semiconductor layer.
申请公布号 JP5959296(B2) 申请公布日期 2016.08.02
申请号 JP20120106563 申请日期 2012.05.08
申请人 株式会社半導体エネルギー研究所 发明人 笹川 慎也;石塚 章広;波多野 剛久
分类号 H01L21/336;H01L29/786 主分类号 H01L21/336
代理机构 代理人
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