发明名称 HEAT PROCESSING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a heat processing device which enables the suppression of deposition of ammonia onto an inner wall surface of a chamber.SOLUTION: In a heat processing device, a coating film 98 of a titanium oxide having a photo-catalytic effect is formed on an inner wall surface of a chamber into which a substrate is loaded, and in which a heat processing by flash light irradiation is performed. Creating an ammonia atmosphere in the chamber for substrate processing, ammonia molecules are deposited on the coating film 98. Casting flash light including a relatively large quantity of wavelength components of an ultraviolet region on the coating film 98 with ammonia deposited thereon, the ammonia is decomposed into nitrogen and hydrogen and removed from the coating film 98 because of the photo-catalytic effect of the titanium oxide. Thus, the deposition of ammonia on the inner wall surface of the chamber can be suppressed.SELECTED DRAWING: Figure 10
申请公布号 JP2016181641(A) 申请公布日期 2016.10.13
申请号 JP20150062027 申请日期 2015.03.25
申请人 SCREEN HOLDINGS CO LTD 发明人 AOYAMA TAKAYUKI
分类号 H01L21/316;H01L21/31 主分类号 H01L21/316
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