| 摘要 |
A wafer stage and a measurement stage are configured so that they are movable along an upper surface of a base plate, and water is transferred therebetween by bringing the stages proximate to one another and moving them integrally in the Y directions. An alignment system measures mutually proximate edge parts of the wafer stage and the measurement stage, and a focus leveling detection system measures a step in the Z directions in a state wherein the wafer stage and the measurement stage are proximate to one another. When both stages are brought proximate to one another, the relative position between the wafer stage and the measurement stage is adjusted based on the measurement results.
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