发明名称 Manufacture method for ZnO-containing compound semiconductor layer
摘要 <p>A manufacture method for a ZnO-containing compound semiconductor layer has the steps of: (a) preparing a substrate; and (b) growing a ZnO-containing semiconductor layer above the substrate by supplying at the same time at least Zn and O as source gases and S as surfactant. There is provided the manufacture method for the ZnO-containing compound semiconductor layer with improved flatness.</p>
申请公布号 EP2031649(A2) 申请公布日期 2009.03.04
申请号 EP20080012033 申请日期 2008.07.03
申请人 STANLEY ELECTRIC CO., LTD. 发明人 YAMAMURO, TOMOFUMI;SANO, MICHIHIRO;KATO, HIROYUKI;OGAWA, AKIO
分类号 H01L21/363;H01L33/06;H01L33/28 主分类号 H01L21/363
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