| 摘要 |
A plasma spray method for the manufacture of an ion conducting membrane, in particular of a hydrogen ion conducting membrane or of an oxygen ion conducting membrane is suggested. In which method the membrane is deposited as a layer (11) on a substrate (10) in a process chamber, wherein a starting material (P) is sprayed onto a surface of the substrate (10) by means of a process gas (G) in the form of a process beam (2). The starting material is injected into a plasma at a low process pressure which is at most 10000 Pa and is partially or completely melted there. In accordance with the invention the substrate (10) has pores (30) which are connected amongst one another so that the substrate (10) is gas permeable and a portion of an overall pore area of an overall area of the coating surface (31, 131) amounts to at least 30%, in particular to at least 40%. |
