| 摘要 |
PROBLEM TO BE SOLVED: To efficiently observe image information of a substrate made of a plurality of materials in an ultraviolet radiation observation device. SOLUTION: The ultraviolet radiation observation device includes a light source 2a for emitting ultraviolet light having a plurality of wavelengths, a lighting lens 2b for irradiating a semiconductor wafer 8 with the ultraviolet light emitted by the light source 2a, an observation optical system for acquiring an image of the semiconductor wafer 8 by illumination light, imaging sections C<SB>1</SB>-C<SB>n</SB>for acquiring luminance data by photoelectric conversion of the image of the semiconductor wafer 8, a wavelength separation section 3a, a coloring processing section for assigning different chromaticities of visible colors to respective luminance data of the plurality of wavelengths obtained by the imaging section C<SB>1</SB>-C<SB>n</SB>using the ultraviolet light separated by the wavelength separation section 3a, and converting the data into a plurality of monochrome images, an image composition section for forming a visible color image by composing the plurality of monochrome images formed by the coloring processing section, and an image display section 10 for displaying the visible color image formed by the image composition section. COPYRIGHT: (C)2008,JPO&INPIT
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