CLEANING DEVICE AND ANALYSIS DEVICE

摘要

A cleaning device and an analysis device which require a reduced amount of cleaning liquid for cleaning a cuvette. In the analysis device, the cross sectional areas (S12, S22) of walls of both a supply nozzle (191) and a suction nozzle (192) that form a cleaning nozzle are set greater than the cross sectional areas (S11, S21) for the inner diameter of the nozzles. As a result, the thickness of the walls of both the supply nozzle (191) and the suction nozzle (192) is increased to increase the volume of the nozzles that occupies the inside of the cuvette (21). This reduces the proportion of cleaning liquid (Ls) occupying the space in the cuvette (21), reducing the amount of the cleaning liquid required to clean the cuvette.