| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist composition that suppresses CD shrinkage or changes in a pattern profile with time and allows stable pattern formation, and a pattern forming method using the composition.SOLUTION: The resist composition comprises (A) a compound represented by formula (1) below, (B) a resin including a predetermined repeating unit, the solubility of which with an organic solvent-containing developing solution changes by an action of an acid, and (C) a photoacid generator. In formula (1), Rto Reach independently represent a hydrogen atom, a hydroxy group, or a linear, branched or cyclic monovalent hydrocarbon group having 1-20 carbon atoms which may have a hetero atom. Rto Rmay be bonded to each other to form a ring together with carbon atoms bonded thereto and a carbon atom therebetween.SELECTED DRAWING: None |
