发明名称 Semiconductor Device and Radio Frequency Module Formed on High Resistivity Substrate
摘要 A semiconductor device includes a high resistivity substrate, a transistor formed on the high resistivity substrate, and a deep trench device isolation region formed in the high resistivity substrate to surround the transistor. Particularly, the high resistivity substrate has a first conductive type, and a deep well region having a second conductive type is formed in the high resistivity substrate. Further, a low concentration well region having the first conductive type is formed on the deep well region, and the transistor is formed on the low concentration well region.
申请公布号 US2016372429(A1) 申请公布日期 2016.12.22
申请号 US201615041561 申请日期 2016.02.11
申请人 Dongbu Hitek Co., Ltd. 发明人 Cho Yong Soo
分类号 H01L23/66;H01L29/08;H01L27/088;H01L29/06 主分类号 H01L23/66
代理机构 代理人
主权项 1. A semiconductor device comprising: a high resistivity substrate having a first conductive type; a deep well region having a second conductive type and arranged in the high resistivity substrate; a low concentration well region having the first conductive type and arranged on the deep well region; a transistor arranged on the low concentration well region; and a deep trench device isolation region arranged in the high resistivity substrate to at least partially surround the transistor.
地址 Seoul KR