| 摘要 |
PROBLEM TO BE SOLVED: To provide a beam processing apparatus and a beam processing method causing no deterioration in the uniformity of beam irradiation on an object to be processed even at the low rotational speed of a rotating disk. SOLUTION: A beam processing apparatus is formed to rotate a rotating disk around a disk axis with a plurality of wafers 110 fitted on the rotating disk 100, and formed to reciprocate the rotating disk in a direction orthogonal to the disk axis. By performing the rotation and reciprocating movement of the rotating disk to the wafer at the same time, beams are irradiated. The rotating disk is formed to reciprocally scan between an inner over scan position and an outer over scan position. The beam processing apparatus includes a control means, which has a function of controlling to always overlap-irradiate the wafer with the beams regardless of the beam size on the basis of the rotational frequency per unit time of the rotating disk, the scan speed and reciprocating scan frequency of the reciprocating scan, and the measured value of the measured beam width of the beam or the fixed value of the beam width of the beam. COPYRIGHT: (C)2008,JPO&INPIT |
