WET CLEANING APPARATUS, AND SYSTEM FOR CLEANING SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To provide a wet cleaning apparatus in which a substrate is cleaned effectively in a short time while reducing the amount of a cleaning liquid to be consumed. SOLUTION: The wet cleaning apparatus, in which the substrate S is cleaned by supplying the cleaning liquid, is provided with: a liquid nozzle 20 having a hollow part 26 which has a supply port 24a of the cleaning liquid and is formed to have a pair of vertically opposed planes 22 arranged so that the substrate S can be made to pass through the hollow part 26; and a supply system for supplying a predetermined flow rate of the cleaning liquid to the liquid nozzle 20. The wet cleaning apparatus is constituted so that the space between the principal surface of the substrate S and any of the opposed planes 22 is kept in a liquid-tight state by the cleaning liquid to be supplied through the supply port 24a during the time to move the substrate S between the opposed planes 22. Ozone nanobubble water in the ozonic water of which minute air bubbles each having <10-6m diameter are incorporated is supplied from the supply system as the cleaning liquid. COPYRIGHT: (C)2009,JPO&INPIT