发明名称 Oxide semiconductor, thin film transistor including the same and method of manufacturing a thin film transistor
摘要 Example embodiments relate to an oxide semiconductor including zinc oxide (ZnO), a thin film transistor including a channel formed of the oxide semiconductor and a method of manufacturing the thin film transistor. The oxide semiconductor may include a GaxInyZnz oxide and at least one material selected from the group consisting of a 4A group element, a 4A group oxide, a rare earth element and combinations thereof.
申请公布号 US2009008638(A1) 申请公布日期 2009.01.08
申请号 US20080078706 申请日期 2008.04.03
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KANG DONG-HUN;SONG I-HUN;PARK YOUNG-SOO;KIM CHANG-JUNG;LEE EUN-HA;LEE JAE-CHEOL
分类号 H01L29/12;H01L21/336 主分类号 H01L29/12
代理机构 代理人
主权项
地址