发明名称 シリコンを使用するチップレベル熱放散
摘要 A semiconductor device that includes a semiconductor chip having a first silicon substrate with opposing first and second surfaces, a semiconductor device formed at or in the first surface, a plurality of first contact pads formed at the first surface which are electrically coupled to the semiconductor device, a layer of thermal conductive material on the second surface, and a plurality of first vias formed partially through the layer of thermal conductive material.
申请公布号 JP5975449(B2) 申请公布日期 2016.08.23
申请号 JP20150088186 申请日期 2015.04.23
申请人 オプティツ インコーポレイテッド 发明人 ヴァーゲ オガネシアン
分类号 H01L23/36 主分类号 H01L23/36
代理机构 代理人
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