发明名称 SUBSTRATE CLEANING DEVICE AND SUBSTRATE CLEANING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a substrate cleaning device and a substrate cleaning method capable of removing adhesion substance from the side face of a substrate and to clean the same.SOLUTION: The substrate cleaning device according to an embodiment includes plural rollers for holding and rotating a substrate. The substrate cleaning device also includes one or more cleaning members provided to one or more rollers in the plural rollers. The plural rollers hold the substrate so that the side face of the substrate comes into contact with the cleaning member.SELECTED DRAWING: Figure 1
申请公布号 JP2016174077(A) 申请公布日期 2016.09.29
申请号 JP20150053248 申请日期 2015.03.17
申请人 TOSHIBA CORP 发明人 KURITA MASATO
分类号 H01L21/304 主分类号 H01L21/304
代理机构 代理人
主权项
地址