| 摘要 |
A resin composition including a polymer (A) having at least one constituent unit derived from a monomer having a structure represented by formula (1), formula (2), or formula (3), the decomposition rate of the structure represented by formula (1), formula (2), or formula (3) in the polymer (A) after 30 days of storage at 40°C being 20% or less. (In the formulas: X represents an ethereal oxygen atom, a sulfidic sulfur atom, or an aminic nitrogen atom; R1 and R2 each represent a hydrogen atom or a C1-10 alkyl group; R3 and R5 each represent a C1-20 alkyl group, cycloalkyl group, or aryl group; and R4 and R6 each represent a C1-10 alkylene group.) |
