| 摘要 |
FIELD: instrument making.SUBSTANCE: invention relates to instrument making and can be used for production of silicon micromechanical sensors. Concept of the invention is as follows: in the method of making elastic elements from monocrystalline silicon a flat round plate with orientation of the base surface in plane (100) is oxidized, a protective photoresist layer is applied onto it followed by photolithography, opened are windows in the oxide layer in the area of forming the elastic elements to a certain width considering anisotropy of etching the monocrystalline silicon, anisotropic etching is performed to a depth to obtain the required thickness of the elastic elements. Simultaneously with the above said operations on formation of the elastic elements a control element is formed located outside the zone of elastic elements, the control element is formed to self-braking to a given depth determined by a given mathematical expression.EFFECT: invention provides easier manufacture of the elastic elements of monocrystalline silicon by assessment of etching the control elements to self-braking.1 cl, 3 dwg |
