| 摘要 |
PROBLEM TO BE SOLVED: To provide an imprint system advantageous for improving a throughput.SOLUTION: An imprint system for forming a pattern of resin by imprinting comprises: a checking device for checking a surface state of plural shot regions of a substrate; first imprint devices (for example, 104-106) for imprinting the shot region whose surface state checked by the checking device satisfies a standard using a first mold; and a second imprint device (for example, 107) for imprinting the short region whose surface state checked by the checking device does not satisfy the standard using a second mold. |
