WASHING LIQUID AND WASHING METHOD FOR GLASS POLISHING DEVICE

摘要

When an alkali-free glass is polished with a polishing liquid that comprises hydrofluoric acid as a main component, sludge is generated on the glass surface and in a reservoir and piping of a polishing device, which causes problems such as degradation in quality and stop of the device. A washing liquid capable of dissolving sludge that is generated in a glass polishing device and contains aluminum and fluorine, said washing liquid being characterized by containing Al3+ ion and capable of dissolving sludge formed by the binding of Al and F to divalent elements such as Mg, Ca, Sr and Ba. The aforesaid problems can be resolved by washing the inside of a polishing device with this washing liquid.