| 摘要 |
PROBLEM TO BE SOLVED: To provide a solvent supplying mechanism capable of supplying the solvent having the optimum characteristics in all usage using the solvent by a coating film forming device without remarkably complicating the configuration of the device. SOLUTION: A resist coating processor 100 includes solvent tanks 55a-55d for storing high solubility solvent A which exhibits high solubility with respect to the resist, high volatility solvent B, low volatility solvent C, and low surface tension solvent D. The solvent supplied from two sets or more of solvent tanks 55a-55d with a predetermined ratio becomes sufficiently mixed condition through a static mixer 54, and is sent to an objective solvent using unit such as prewet nozzle 50 or the like. COPYRIGHT: (C)2008,JPO&INPIT
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