| 摘要 |
In a method of further enhancing the performance of a narrow active cell IE type trench gate IGBT having the width of active cells narrower than that of inactive cells, it is effective to shrink the cells so that the IE effects are enhanced. However, when the cells are shrunk simply, the switching speed is reduced due to increased gate capacitance. A cell formation area (10) of the IE type trench gate IGBT is basically composed of first linear unit cell areas (40f) having linear active cell areas (40a), second linear unit cell areas (40s) having linear hole collector areas (40c) and linear inactive cell areas (40i) disposed therebetween. |
